发明名称 PROCESS FOR INTEGRATING PLANAR AND NON-PLANAR CMOS TRANSISTORS ON A BULK SUBSTRATE AND ARTICLE MADE THEREBY
摘要 <p>A process capable of integrating both planar (10) and non-planar (20, 30) transistors onto a bulk semiconductor substrate, wherein the channel of all transistors is definable over a continuous range of widths.</p>
申请公布号 WO2007038575(A3) 申请公布日期 2007.07.19
申请号 WO2006US37634 申请日期 2006.09.26
申请人 INTEL CORPORATION;KAVALIEROS, JACK;BRASK, JUSTIN;DOYLE, BRIAN;SHAH, UDAY;DATTA, SUMAN;DOCZY, MARK;METZ, MATTHEW;CHAU, ROBERT 发明人 KAVALIEROS, JACK;BRASK, JUSTIN;DOYLE, BRIAN;SHAH, UDAY;DATTA, SUMAN;DOCZY, MARK;METZ, MATTHEW;CHAU, ROBERT
分类号 H01L21/8234;H01L21/336;H01L29/10 主分类号 H01L21/8234
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