发明名称 Semiconductor device with multiple channels and method of fabricating the same
摘要 A semiconductor device with multiple channels includes a semiconductor substrate and a pair of conductive regions spaced apart from each other on the semiconductor substrate and having sidewalls that face to each other. A partial insulation layer is disposed on the semiconductor substrate between the conductive regions. A channel layer in the form of at least two bridges contacts the partial insulation layer, the at least two bridges being spaced apart from each other in a first direction and connecting the conductive regions with each other in a second direction that is at an angle relative to the first direction. A gate insulation layer is on the channel layer, and a gate electrode layer on the gate insulation layer and surrounding a portion of the channel layer.
申请公布号 US2007158679(A1) 申请公布日期 2007.07.12
申请号 US20060517211 申请日期 2006.09.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LI MING;YEO KYOUNG-HWAN;KIM SUNG-MIN;SUK SUNG-DAE;KIM DONG-WON
分类号 H01L29/74 主分类号 H01L29/74
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