发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To more efficiently process a substrate by effectively utilizing a plurality of exposure apparatuses. SOLUTION: A substrate processing system comprises a substrate processing apparatus 1 having a composite processor including an indexer 2 or the like, and two exposure apparatuses 101, 102. The substrate processing apparatus 1 comprises an interface 60 for delivering the substrate for the exposure apparatuses 101, 102, an input device 114 or the like capable of designating with which exposure apparatus exposure processing is done, and a control unit 110 for controlling the interface 60 and the indexer 2 according to designated contents. The control unit 110, when a preceding lot designates only a specific exposure apparatus 101(or 102) and designation of a successive lot includes exposure apparatuses 102(or 101) other than at least the above specified exposure apparatus, controls the system to start conveying-in of substrates of the successive lot before the conveying-in of all substrates of the preceding lot is completed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007180180(A) 申请公布日期 2007.07.12
申请号 JP20050375382 申请日期 2005.12.27
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TAKETO SEIJI;ISHITOME TAKANORI
分类号 H01L21/027;G02F1/13;H01L21/677 主分类号 H01L21/027
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