Solid image sensor using junction gate type field-effect transistor as pixel

摘要

Solid-state imager with a plurality of pixels formed in a semiconductor substrate (20). Inside a well region (21) of a first conductive type a source (42) and a drain (41) of the opposite conductive type are formed. Between source (42) and drain (41) a barrier region (43) of the first conductive type is formed. Directly underneath the barrier region is a third semiconductor region (44) of the second conductive type to modulate the field distribution inside the well.