发明名称 |
Apparatus and methods for detecting overlay errors using scatterometry |
摘要 |
Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. There are predefined offsets between the first and second structures. Using a scatterometry overlay metrology, scatterometry overlay data is obtained from a first set of the periodic targets based on one or more measured optical signals from the first target set on the sample. Using an imaging overlay metrology, imaging overlay data is obtained from a second set of the periodic targets based on one or more image(s) from the second target set on the sample.
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申请公布号 |
US7242477(B2) |
申请公布日期 |
2007.07.10 |
申请号 |
US20040785430 |
申请日期 |
2004.02.23 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
MIEHER WALTER D.;LEVY ADY;GOLOVANESKY BORIS;FRIEDMANN MICHAEL;SMITH IAN;ADEL MICHAEL E.;GHINOVKER MARK;BEVIS CHRISTOPHER F.;KNOLL NOAM;BARUCH MOSHE |
分类号 |
G01B11/00;G03F7/20;G03F9/00 |
主分类号 |
G01B11/00 |
代理机构 |
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主权项 |
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地址 |
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