| 发明名称 |
System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold |
| 摘要 |
One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also includes a cleaning system for cleaning the substrate.
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| 申请公布号 |
US7240679(B2) |
申请公布日期 |
2007.07.10 |
| 申请号 |
US20020330897 |
申请日期 |
2002.12.24 |
| 申请人 |
LAM RESEARCH CORPORATION |
发明人 |
WOODS CARL;DE LARIOS JOHN |
| 分类号 |
B08B3/00;C25D5/22;C25D7/12;F26B5/12;H01L21/00 |
主分类号 |
B08B3/00 |
| 代理机构 |
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