| 摘要 |
<P>PROBLEM TO BE SOLVED: To make high precision and high speed the measurement of flare generated in a projection optical system. <P>SOLUTION: In the optical property measuring apparatus, light from a light screening pattern disposed in an object surface side of a projection optical system is detected via the projection optical system and an aperture pattern SLTY, and optical characteristics of the projection optical system is measured. The apparatus has an aperture substrate 110 with a first area FA set to include the aperture pattern SLTY and a periphery of the first area FA, and a second area SA whose optical concentration to the light is set higher than that of the first area FA; a detection device 130 for detecting light intensity distribution of light via the projection optical system and the aperture substrate 110; and a control device which calculates information regarding flare of the projection optical system from light intensity distribution detected by the detection device 130. <P>COPYRIGHT: (C)2007,JPO&INPIT |
