发明名称 CHEMICAL SUBSTANCE MONITORING APPARATUS AND METHOD FOR CLEANING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a chemical substance monitoring apparatus, capable of easily cleaning substances adsorbed by a sample supply part and an ionization part, preventing reduction in the detection sensitivity of substances to be measured, accompanying the effects due to the adsorbed substances, and of performing stable measurements. SOLUTION: The chemical substance monitoring apparatus 1 is provided with the ionization part 5 for generating ions of chemical substances contained in a sample; the sample supply part 4 for supplying the ionization part with the sample; a mass analyzer 6 for performing mass analysis of ions generated at the ionization part 5; a data processing part 7 for processing data, on the basis of the data of the result of mass analysis by the mass analyzer 6; a display part 8 for displaying the results of data processing by the data processing part 7; and desorbing-gas addition means 2 and 3 for adding a desorbing gas. which desorbs adsorbed substances adsorbed to the inside of the sample supply part 4 and the ionization part 5, via the sample supply part 4. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007170985(A) 申请公布日期 2007.07.05
申请号 JP20050369100 申请日期 2005.12.22
申请人 HITACHI LTD 发明人 KAN MASAO;TAKADA YASUAKI;WAKE IZUMI;NAGANO HISASHI;KASHIMA HIDEO
分类号 G01N27/62 主分类号 G01N27/62
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