IMPROVING RESIST RESOLUTION USING ANISOTROPIC ACID DIFFUSION

摘要

Methods for increasing the resolution capability and line edge roughness of resists, including chemically amplified resists are disclosed. In order to improve upon the resolution, dipolar species may be coupled to a photoacid group and/or added to the resist, where the dipolar species may influence the direction of acid diffusion. An electric field may be applied to a post-exposure bake process and/or a soft bake process and the resist layer is developed.