发明名称 TECHNIQUE FOR PROVIDING AN INDUCTIVELY COUPLED RADIO FREQUENCY PLASMA FLOOD GUN
摘要 A technique for providing an inductively coupled radio frequency plasma flood gun is disclosed. In one particular exemplary embodiment, the technique may be realized as a plasma flood gun in an ion implantation system. The plasma flood gun may comprise: a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; and a power source capable of inductively coupling radio frequency electrical power into the plasma chamber to excite the at least one gaseous substance to generate a plasma. Entire inner surface of the plasma chamber may be free of metal -containing material and the plasma may not be exposed to any metal -containing component within the plasma chamber. In addition, the one or more apertures may be wide enough for at least one portion of charged particles from the plasma to flow through.
申请公布号 WO2007075344(A2) 申请公布日期 2007.07.05
申请号 WO2006US47623 申请日期 2006.12.13
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;KURUNCZI, PETER, F.;LOW, RUSSELL;PEREL, ALEXANDER, S.;COBB, ERIC, R.;WRIGHT, ETHAN, ADAM 发明人 KURUNCZI, PETER, F.;LOW, RUSSELL;PEREL, ALEXANDER, S.;COBB, ERIC, R.;WRIGHT, ETHAN, ADAM
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