发明名称 THINNER COMPOSITION FOR INHIBITING PHOTORESIST FROM DRYING
摘要 Provided is a thinner composition for preventing a photosensitizer from curing at the end of a spray nozzle of the photosensitizer during a semiconductor fabrication process, which shows an excellent dissolution rate and volatility. The thinner composition comprises: (i) an alkyl acetate compound; (ii) an ether compound; and (iii) a cycloketone compound. The alkyl acetate compound includes ethyl acetate, n-propyl acetate, n-butyl acetate or pentyl acetate. The ether compound includes anisole, 1,3-dimethoxybenzene or 1,4-dimethoxybenzene. The cycloketone compound includes cyclopentanone or cyclohexanone. The thinner composition comprises: 100 parts by weight of the alkyl acetate compound; 10-44 parts by weight of the ether compound; and 0.1-30 parts by weight of the cycloketone compound.
申请公布号 KR20070071557(A) 申请公布日期 2007.07.04
申请号 KR20050135112 申请日期 2005.12.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KANG, EUNG KIL;LEE, GEUN SU
分类号 G03F7/32;G03F7/42 主分类号 G03F7/32
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