MONITORING AND CORRECTING BRAGG GRATINGS DURING THEIR FABRICATION

摘要

In accordance with some embodiments of the present invention, while a Bragg grating (16) is being written in a substrate (14), measurements may be taken to allo w changes to be made in the writing process to reduce errors that may occur in the written grating (16). In one embodiment, multiple scans of the writing beam (U) can be used. After a scan, measurements of the characteristics of the grating (16) being written can be taken and corrections may be implemented on subsequent scans.