IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME

摘要

An image sensor and a method for manufacturing the same are provided to improve the sensibility of the image sensor and to simplify the manufacturing process by reducing the distance between a photodiode and a micro-lens using two passivation layers. A substrate(20) having a pixel region and a peripheral region is prepared. A top metal line(21a) is formed on the peripheral region. A first passivation layer is formed on the resultant structure to cover the top metal line for improving the step coverage between the pixel and the peripheral regions. A second passivation layer(23) having uniform thickness is then formed on the first passivation layer for removing the step between the pixel and the peripheral region.