COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM, METHOD FOR PREPARING SAME, AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SAME

摘要

Disclosed is a coating liquid for forming an amorphous silica coating film which has a dielectric constant as low as 3.0 or less and low leakage current. Also disclosed is a method for preparing such a coating liquid. Specifically disclosed is a coating liquid for forming a low dielectric constant amorphous silica coating film which is characterized by being a liquid composition containing (a) a silicon compound obtained by hydrolyzing a tetraalkyl orthosilicate (TAOS) and an alkoxysilane (AS) in the presence of a tetraalkyl ammonium hydroxide (TAAOH) and water, or a silicon compound obtained by hydrolyzing or partially hydrolyzing a tetraalkyl orthosilicate (TAOS) in the presence of a tetraalkyl ammonium hydroxide (TAAOH) and water, then mixing the resulting with an alkoxysilane (AS) or a hydrolysis product or partial hydrolysis product thereof, and then, if necessary, further hydrolyzing a part or the entire of the resulting mixture; (b) an organic solvent; and (c) water. The coating liquid is further characterized in that the amount of water contained in the liquid composition is within the range of 30-60% by weight.