| 摘要 |
<p>An exposure apparatus (EX) fills an optical path space of an exposure light (EL) with a liquid (LQ), and exposes a substrate (P) by irradiating the substrate (P) with the exposure light (EL) through a projection optical system (PL) and the liquid (LQ). A first optical element (LS1) of the projection optical system (PL) is provided with a recessed surface part (2) which is brought into contact with the liquid (LQ). The exposure apparatus (EX) is provided with a removing apparatus (40) for removing foreign materials on the inner side the recessed surface part (2). Immersion exposure is performed by permitting the exposure light to excellently reach an image plane through the projection optical system and the liquid.</p> |
