| 摘要 |
A manufacturing method of an array substrate for an LCD(Liquid Crystal Display) is provided to remove the wavy noise generated by an exposed semiconductor layer, thereby improving the image quality. A gate line extended toward a direction and a gate electrode(115) are formed on a substrate. A gate insulation layer is formed on the gate line and gate electrode. A data line(134) is formed on the gate insulation layer and defines a pixel area by crossing with the gate line and simultaneously an active layer, an impurity amorphous pattern and a metal pattern are sequentially formed. A passivation layer having a gate electrode and the first groove and a drain control hole are formed on the data line and metal pattern so that the metal pattern corresponding to a portion separated from the gate electrode is exposed. The exposed metal pattern and amorphous pattern are removed so that the active layer is exposed. An ohmic contact layer of the impurity silicon layer and source and drain electrodes(136,138) are formed. A drain contact hole and the first photoresist pattern are formed on the passivation layer. A transparent conductive material layer is formed on the entire surface of the first photoresist pattern and contacted with the drain electrode. A photoresist layer is formed on the transparent conductive layer and the transparent conductive layer is exposed by ashing. The exposed transparent conductive layer is etched so that a pixel electrode(161) is formed. |
