发明名称 |
APPARATUS FOR DRYING SUBSTRATE |
摘要 |
An apparatus for drying a substrate is provided to prevent a slit or a nozzle from being stopped up and prevent a process defect of a substrate by supplying proper fluid to an air knife. A fluid supply part supplies fluid for drying a substrate. An open/shut valve(3) for passing through or blocking the fluid of the fluid supply part is formed in a valve body(5). A fluid injecting part injects the fluid passing through the valve body to the substrate. A bypass duct(11) which detours the open/shut valve is installed in the valve body, a flowrate control valve(13) controls the flowrate of the fluid passing through the bypass duct. The fluid control valve can be made of a needle valve for adjusting the flowrate.
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申请公布号 |
KR20070068028(A) |
申请公布日期 |
2007.06.29 |
申请号 |
KR20050129679 |
申请日期 |
2005.12.26 |
申请人 |
DMS CO., LTD. |
发明人 |
KIM, YOUNG IK;HWANG, WON TAE |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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