发明名称 APPARATUS FOR DRYING SUBSTRATE
摘要 An apparatus for drying a substrate is provided to prevent a slit or a nozzle from being stopped up and prevent a process defect of a substrate by supplying proper fluid to an air knife. A fluid supply part supplies fluid for drying a substrate. An open/shut valve(3) for passing through or blocking the fluid of the fluid supply part is formed in a valve body(5). A fluid injecting part injects the fluid passing through the valve body to the substrate. A bypass duct(11) which detours the open/shut valve is installed in the valve body, a flowrate control valve(13) controls the flowrate of the fluid passing through the bypass duct. The fluid control valve can be made of a needle valve for adjusting the flowrate.
申请公布号 KR20070068028(A) 申请公布日期 2007.06.29
申请号 KR20050129679 申请日期 2005.12.26
申请人 DMS CO., LTD. 发明人 KIM, YOUNG IK;HWANG, WON TAE
分类号 H01L21/304 主分类号 H01L21/304
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