发明名称 |
Thin film transistor of liquid crystal display with amorphous silicon active layer and amorphous diamond ohmic contact layers |
摘要 |
In thin film transistor, an amorphous diamond is used as an ohmic layer formed between an active layer and a source and drain electrodes. Specifically, in a inverse staggered type thin film transistor, a gate electrode and a gate insulating layer are formed on an insulating substrate. On the gate insulating layer is formed an active layer. An etch stopper is formed on the active layer, overlapping with the gate electrode. Thereafter, an amorphous diamond is overlappingly formed on the gate electrode on a resultant structure and then a metal layer is formed on the resultant in which the ohmic layer is formed. The metal layer and the amorphous diamond layer is patterned until the etch stopper is exposed, forming the ohmic layer and a source electrode and a drain electrode.
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申请公布号 |
US6166400(A) |
申请公布日期 |
2000.12.26 |
申请号 |
US19980105871 |
申请日期 |
1998.06.26 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
CHANG, PARK KYU;JIN, SEO KUK |
分类号 |
G02F1/136;G02F1/1368;H01L21/205;H01L21/336;H01L29/786;(IPC1-7):H01L31/031 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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