Procedure for elaboration of sequenced nano-structures e.g. for micro-electronics comprises substrate delivery and attack phases to produce nanometric projections

摘要

#CMT# #/CMT# The procedure for creating sequenced nano-structures consists of providing a substrate (100) with a barrier layer (2) beneath a crystalline film less than one micrometre thick with lattice defects and/or stress fields in a crystalline zone and subjecting it to one or more attack stages. The attack stages expose the barrier layer locally and create projections (7) on a nanometric scale, separated by recesses (7.1) with their bases in the barrier layer to form nano-structures (7, 8). The height of the nano-structures can be increased, if necessary, by engraving the barrier layer, with the projections acting as a mask during this process. #CMT#USE : #/CMT# Creating sequenced nano-structures on a substrate. #CMT#ADVANTAGE : #/CMT# The dimensions and positions of the nano-structures are homogeneous with the scale of the substrate. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawings show an enlarged cross-section of part of the substrate during the formation of the nano-structures. 2 : Barrier layer 5 : Crystalline film 7 : Projections 7.1 : Recessses 8 : Nano-structures 100 : Substrate.