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发明名称
IMMERSION PHOTOLITHOGRAPHY WITH MEGASONIC RINSE
摘要
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist.
申请公布号
KR100733994(B1)
申请公布日期
2007.06.29
申请号
KR20050112164
申请日期
2005.11.23
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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