| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning liquid that can be used for cleaning a chemical supply apparatus for semiconductor manufacturing which supplies at least one kind of photoresist film forming material, used particularly in immersion exposure processes, a material for forming a photoresist upper layer protecting film, and a fluorine-based organic solvent; that has superior cleaning performance, and moreover, that will not reduce the transparency of the material for forming photoresist upper layer protection film. <P>SOLUTION: A cleaning liquid is used for cleaning a chemical supply apparatus used in a semiconductor manufacturing process, and contains at least hydrofluoroether. <P>COPYRIGHT: (C)2007,JPO&INPIT |
