| 发明名称 |
Multi-printed etch mask process to pattern features |
| 摘要 |
A method for patterning fine features using multiple jet-printed etch masks includes forming an initial feature through a first jet-printed etch mask and re-shaping the initial feature through at least one additional jet-printed etch mask.
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| 申请公布号 |
US2007145002(A1) |
申请公布日期 |
2007.06.28 |
| 申请号 |
US20050315713 |
申请日期 |
2005.12.22 |
| 申请人 |
PALO ALTO RESEARCH CENTER INCORPORATED |
发明人 |
STREET ROBERT A. |
| 分类号 |
C23F1/00;B44C1/22;C03C15/00 |
主分类号 |
C23F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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