发明名称 EXPOSURE METHOD AND APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To easily adjust the formation state of a pattern image with accuracy when switching various illumination conditions and so on. <P>SOLUTION: The exposure method of illuminating a reticle R with exposure light IL and forming a pattern image of the reticle R on a wafer W through a projection optical system PL, comprises a calculation step of calculating moment information corresponding to an integral of the product of a distance from the reference position and an amount of exposure light IL on a plane conjugated to the pupil surface of the projection optical system PL, and an adjustment step of adjusting the formation state of the pattern image, based on the moment information calculated by the calculation step. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007165845(A) 申请公布日期 2007.06.28
申请号 JP20060264071 申请日期 2006.09.28
申请人 NIKON CORP 发明人 UEHARA YUSAKU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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