| 摘要 |
A method of coating the surface of an inorganic substrate of glass, silicon dioxide, ceramics or carbon, which method comprises a step of cleaning the surface of the substrate by subjecting the surface to a reducing gas plasma and forming a first layer on the substrate surface using a plasma enhanced polymerization process employing one or more monomers comprising monomers with a sufficient low molecular weight for them to be in their gaseous state in the gas plasma, selected from the group consisting of C<SUB>1</SUB>-C<SUB>16 </SUB>alkanes, C<SUB>2</SUB>-C<SUB>16 </SUB>alkenes, C<SUB>2</SUB>-C<SUB>16 </SUB>alkynes, styrene, aromatic monomers of styrene compounds, monomers of vinyl- and acrylate-compounds.
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