| 摘要 |
PROBLEM TO BE SOLVED: To provide a high frequency measurement system that can be calibrated in a prescribed frequency range by calibration data generated from calibration data to a holding partial frequency even in a plasma treatment system using a high frequency power source device changing a frequency. SOLUTION: The high frequency measurement system comprises: a signal detection means for detecting a high frequency signal; a calibration data storage means for storing the calibration data Cmin, Cmax for calibrating a detection value Amin in a lower limit frequency fmin and a detection value Amax in an upper limit frequency fmax to respective true measuring values ASmin, ASmax; a frequency detection means for detecting the frequency fm of the high frequency signal; a calibration data calculation means for calculating the calibration data Cm to the frequency fm; and a measured value calibration means for calibrating a detection value Am detected by the signal detection means to a true measuring value ASm by using the calibration data Cm calculated with the calibration data calculation means. COPYRIGHT: (C)2007,JPO&INPIT
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