发明名称 METHOD AND APPARATUS FOR FORMING MICROSPHERE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming a microsphere capable of exerting a stable performance, by forming the microshere of a fixed size. SOLUTION: A microsphere raw material 11 containing a liquid organometallic compound or a liquid organosilicon compound is atomized to obtain a liquid particulate 15. The liquid particulate 15 is heated to decompose the liquid organometallic compound or the liquid organosilicon compound and subsequently cooled to form the microsphere 15b. The microsphere 15b is deposited on a semiconductor wafer 18 to form a porous membrane 17 comprising the microsphere 15b. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007162133(A) 申请公布日期 2007.06.28
申请号 JP20060319790 申请日期 2006.11.28
申请人 SEIKO EPSON CORP 发明人 MIYAGAWA TAKUYA
分类号 C23C18/12;B01J19/00;B01J19/08;B22F9/02;B22F9/30;C01B21/06;C01B33/02;C01B33/12;C01B33/18 主分类号 C23C18/12
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