发明名称 Amorphous silicon waveguides on lll/V substrates with barrier layer
摘要 An optical device and a method of forming the same is described. The optical waveguide includes a substrate, an etch-stop layer adjacent to the substrate, a barrier layer adjacent to the etch-stop layer, and an active waveguide having a lower cladding layer adjacent to the barrier layer. Also described is a method of coupling to at least one active waveguide. The method includes etching an active waveguide with a high selectivity towards a crystallographic plane to form a sloped terminice with respect to a substrate upon which the active waveguide is formed, and depositing at least one other waveguide over the etched sloped terminice and at least a portion of the substrate, wherein the at least one other waveguide is photonically coupled to the etched active waveguide to provide photonic interconnectivity for the etched active waveguide.
申请公布号 US2007147761(A1) 申请公布日期 2007.06.28
申请号 US20060544448 申请日期 2006.10.06
申请人 KWAKERNAAK MARTIN H;CHAN WINSTON K;KIM JONGJIN G;MALEY NAGENDRANATH;HERR LESLIE 发明人 KWAKERNAAK MARTIN H.;CHAN WINSTON K.;KIM JONGJIN G.;MALEY NAGENDRANATH;HERR LESLIE
分类号 G02B6/10 主分类号 G02B6/10
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