发明名称 |
Shower plate, plasma processing apparatus, and product manufacturing method |
摘要 |
A system for processing a substrate uniformly by increasing the number of gas discharge holes being arranged per unit area of a shower plate as receding from the center of the shower plate or increasing the radii of the gas discharge holes as receding from the center of the shower plate thereby making the plasma excitation gas flow uniform.
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申请公布号 |
US2007144671(A1) |
申请公布日期 |
2007.06.28 |
申请号 |
US20040584340 |
申请日期 |
2004.09.24 |
申请人 |
FOUNDATION FOR ADVACEMENT OF INTERNATIONAL SCIENCE |
发明人 |
OHMI TADAHIRO;HIRAYAMA MASAKI;GOTO TETSUYA |
分类号 |
H01L21/306;C23C16/00;C23C16/455;C23F1/00;H01J37/32;H01L21/3065 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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