发明名称 PROCESS FOR MANUFACTURING DROPLET DISCHARGE HEAD, DROPLET DISCHARGE HEAD AND DROPLET DISCHARGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a process for manufacturing an easy-to-manufacture droplet discharge head which can be miniaturized while attaining high resolution by achieving formation of nozzles at high density and fine pitch wiring incident thereto, and to provide a droplet discharge head manufactured through this process, and a droplet discharge device equipped with that droplet ejection head. SOLUTION: An opening 72A becoming an interconnection path 50 and a trench 72B becoming a pressure chamber 115 are formed in a silicon substrate 72, and the opening 72A and the trench 72B are filled with glass paste 76. Curing heat treatment of the glass paste 76 is then carried out at a temperature higher than the film deposition temperature of an oscillation plate 48 and a piezoelectric element 46 to form the oscillation plate 48 and the piezoelectric element 46 on the silicon substrate 72. Subsequently, the glass paste 76 is removed by etching using solution or gas containing hydrogen fluoride thus manufacturing a droplet discharge head 32. The droplet discharge head 32 is manufactured through this manufacturing process, and a droplet discharge device 10 is equipped with that droplet discharge head 32. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007160535(A) 申请公布日期 2007.06.28
申请号 JP20050356250 申请日期 2005.12.09
申请人 FUJI XEROX CO LTD 发明人 MURATA MICHIAKI
分类号 B41J2/16;B41J2/045;B41J2/055 主分类号 B41J2/16
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