| 摘要 |
A phase shift mask and a method for fabricating the same are provided. The phase shift mask includes: a substrate; a multiple thin layer structure formed over the substrate, the multiple thin layer structure including an opening formed to a predetermined depth; and an absorption material filling a portion of the opening. The method includes: preparing a substrate; forming a multiple thin layer structure over the substrate; etching a portion of the multiple thin layer structure to form an opening; and filling a portion of the opening with an absorption material.
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