发明名称 COMPOSITION FOR REMOVING RESIDUE FROM WIRING BOARD AND CLEANING METHOD
摘要 <p>Disclosed is a composition for removing residues from wiring boards, which contains an oxidizing agent and an azole compound while having a pH of 1-7. Also disclosed is a method for cleaning a wiring board wherein residues are removed from a wiring board after dry etching by using such a composition. By using such a composition for removing residues, residues remaining after dry etching which are derived from the resist or metals can be effectively removed without corroding highly corrosion-prone titanium or titanium alloys during production of a wiring board. Consequently, a semiconductor device using a wiring board particularly containing titanium or a titanium alloy can be produced efficiently.</p>
申请公布号 WO2007072727(A1) 申请公布日期 2007.06.28
申请号 WO2006JP324928 申请日期 2006.12.14
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC.;KUWABARA, EIKO;KASHIWAGI, HIDEO;MATSUNAGA, HIROSHI;OHTO, MASARU 发明人 KUWABARA, EIKO;KASHIWAGI, HIDEO;MATSUNAGA, HIROSHI;OHTO, MASARU
分类号 H05K3/26;B08B3/08;C11D7/18;C11D7/32;C11D7/60;H01L21/304 主分类号 H05K3/26
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