发明名称 APPARATUS THAT CONTROL POSITION OF LARGE SUBSTRATE TREATMENT MODULE
摘要 A position control apparatus of a large sized substrate process module is provided to easily control a position of the large sized substrate process module and to reduce process time by controlling an interval between the large sized substrate process module and a substrate and a spray angle at the outside of a bath. A moving shaft(210) is protruded to the outside through a vertical long hole(110) prepared on an external wall of a bath(100). A fixing installation substrate(300) has a vertical long hole corresponding to the vertical long hole prepared on the external wall of the bath. The fixing installation substrate is coupled to the external wall of the bath. A moving installation substrate(400) fixes the moving shaft from the outside of the fixing installation substrate in a rotatable state. The moving installation substrate is supported on the fixing installation substrate to move up and down. An angle fixing substrate(500) is coupled to the outside of the moving installation substrate to prevent rotation of the moving shaft whose angle is controlled.
申请公布号 KR20070066677(A) 申请公布日期 2007.06.27
申请号 KR20050128117 申请日期 2005.12.22
申请人 K.C.TECH CO., LTD. 发明人 HAN, KWANG HOON
分类号 H01L21/68 主分类号 H01L21/68
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