| 摘要 |
A baking apparatus is provided to stably perform a baking process maintaining exhaust pressure constantly using a mass flow controller installed between a cover and a pumping unit. A stage(110) supports a substrate(10), and has a heater(116) for performing a baking process for a film formed on the substrate. A cover(130) is disposed on the state, and defines a space in which the baking process is performed. A pumping unit(184) is provided on one end of an exhaust pipe(182) connected to the cover, and generates exhaust pressure to discharge gas containing by-products generated in the baking process. A mass flow controller(186) is installed in the exhaust pipe between the pumping unit and the cover.
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