| 摘要 |
A method for manufacturing a reticle is provided to shorten a preparing time by directly forming a pattern of a photo soldering resist on a quartz substrate. A photo soldering resist(12) is coated on a quartz substrate(10), and then is exposed by light using a film having a predetermined pattern as a mask. Non-exposed portion of the photo soldering resist is removed to form a photo soldering resist pattern. The photo soldering resist pattern is cured by heat. The exposure of the photo soldering resist employs ultraviolet rays, and the non-exposed portion is removed by using a developing solution.
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