发明名称 ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To make a gate length short and constant when an organic transistor is formed without using a photolithography. SOLUTION: After a gate electrode is formed in a substrate by using the substrate with a trench; the substrate is made hydrophilic, and then a gate insulating film is formed. A source and drain electrode is formed very near the gate insulating film by a difference of a surface energy between the gate insulating film and the substrate, and finally, a semiconductor layer is formed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007158003(A) 申请公布日期 2007.06.21
申请号 JP20050350844 申请日期 2005.12.05
申请人 CANON INC 发明人 SHIKAME OSAMU
分类号 H01L29/786;H01L21/336;H01L29/41;H01L29/423;H01L29/49;H01L51/05;H01L51/40 主分类号 H01L29/786
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