WAFER EDGE EXPOSURE APPARATUS

摘要

A WEE(Wafer Edge Exposure) apparatus is provided to improve light efficiency and to enhance the profile of a photoresist layer by forming a ring type light corresponding to an edge portion of a wafer using an improved optical unit. A WEE apparatus includes a light source, an optical unit and a ring lens. The light source(220) is used for generating light. The optical unit(230) is used for forming a ring type light corresponding to an edge portion of a wafer by using the light generated from the light source. The ring lens(280) is used for guiding the ring type light to the edge portion of the wafer. The WEE apparatus further includes a chuck capable of supporting the wafer.