发明名称 MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR TRANSPARENT CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a transparent conductive film in which the improvement in the uniformity of a resistivity distribution is achieved. SOLUTION: In the manufacturing method for the transparent conductive film, a zinc oxide doped with at least aluminum is used as a target 20 and the transparent conductive film is formed on a substrate 30 by a magnetron sputtering method using a sputter voltage with high frequency electric power superimposed on DC electric power. According to such embodiment, the suppression of the oxidation in a part opposing to erosion is made possible and the nonuniformity of the resistivity distribution of the transparent conductive film considered to be caused by the excessive oxidation can be ameliorated. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007154255(A) 申请公布日期 2007.06.21
申请号 JP20050350575 申请日期 2005.12.05
申请人 KANAZAWA INST OF TECHNOLOGY 发明人 MINAMI UCHITSUGU;MIYATA TOSHIHIRO
分类号 C23C14/08;C23C14/34;C23C14/35;C23C14/38;C23C14/40;H01B13/00 主分类号 C23C14/08
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