发明名称 SOLID-STATE IMAGING ELEMENT AND ITS MANUFACTURING METHOD, SOLID-STATE IMAGING APPARATUS, AND ELECTRONIC INFORMATION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To suppress shading without complicating mask design even if an exit pupil distance is short, in a solid-state imaging element provided with a microlens on a light receiver. <P>SOLUTION: The solid-state imaging element 10A is provided with a plurality of light receivers 2 that are arranged in two-dimensional manner (or like a matrix) at a specified pitch on a semiconductor substrate 1 and microlenses 6 to condense an incident light L to the light receiver 2 that are arranged onto the corresponding light receivers 2. In this case, a lens member 9 made of a transparent resin material is directly formed on each of the microlenses 3 on the entire light receiving surface (imaging area), and the refraction by lens effect of the lens member 9 is used to lead a tilt incident light to an opening (light receiver 2) of a light shielding film 5, thus ensuring a specified incidence rate to the light receiver 2. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007157783(A) 申请公布日期 2007.06.21
申请号 JP20050347075 申请日期 2005.11.30
申请人 SHARP CORP 发明人 OMORI MITSUAKI
分类号 H01L27/14;G02B3/00;H04N1/028;H04N5/335;H04N5/361;H04N5/369;H04N101/00 主分类号 H01L27/14
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