发明名称 SINGLE-POLY PURE CMOS FLASH MEMORY DEVICE, METHOD FOR FABRICATING AND DRIVING THE SAME
摘要 A flash memory device, a method for manufacturing the same and a driving method thereof are provided to use only one high voltage switching circuit by a selective transistor and to build a control gate and a floating gate into a single layer. A flash memory device includes a select transistor and a memory transistor. The select transistor is used for selecting an aiming cell according to a predetermined signal, wherein the predetermined signal is applied to a gate(33) between a common source line and a bit line. The memory transistor is selected by the select transistor. The memory transistor is used for storing data. The memory transistor is composed of a floating gate(34) for storing the data and a first conductive type well for programming or erasing the data of the floating gate.
申请公布号 KR20070063934(A) 申请公布日期 2007.06.20
申请号 KR20050124323 申请日期 2005.12.16
申请人 CHUNG CHOUNG BUK DO;CHUNGBUK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION 发明人 KIM, SUK IL;PARK, KEUN HYUNG;CHOI, HO YONG
分类号 H01L27/115 主分类号 H01L27/115
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