发明名称 Electroplating bath containing wetting agent for defect reduction
摘要 An electroplating solution contains a wetting agent in addition to a suppressor and an accelerator. In some embodiments, the solution has a cloud point temperature greater than 35° C. to avoid precipitation of wetting agent or other solute out of the plating solution. In some embodiments, the wetting agent decreases the air-liquid surface tension of the electroplating solution to 60 dyne/cm<SUP>2 </SUP>or less to increase the wetting ability of the solution with a substrate surface. In some embodiments of a method for plating metal onto substrate surface, the electroplating solution has a measured contact angle with the substrate surface less than 60 degrees.
申请公布号 US7232513(B1) 申请公布日期 2007.06.19
申请号 US20040879613 申请日期 2004.06.29
申请人 NOVELLUS SYSTEMS, INC. 发明人 WEBB ERIC G.;REID JONATHAN D.;SUKAMTO JOHN H.;TAKADA YUICHI
分类号 C25D3/38;C25D5/02 主分类号 C25D3/38
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