| 摘要 |
A method for manufacturing an exposure photomask is provided to minimize an unpatterned region and therefore to be capable of producing an exposure photomask with high reliability. The method for manufacturing an exposure photomask comprises the steps of: forming a light-shielding film(102) and a photosensitive film(104) on a mask substrate(100) sequentially; removing a portion of the photosensitive film(104) on an edge of the mask substrate(100); bonding a gold wire to the light-shielding film(102) exposed in the removed portion of the photosensitive film(104) for grounding; forming photosensitive film patterns defining a region for forming light-shielding film patterns; and patterning the light-shielding film with the photosensitive film patterns as a mask.
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