发明名称 |
Photosensitive resin composition and coating film cured product thereof |
摘要 |
A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule. Further, a photosensitive resin composition comprising a resin (A2) having fluorine atom-containing groups and ethylenic double bonds, a resin (A3) having silicon atom-containing groups and ethylenic double bonds, a radical initiator (B), and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule.
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申请公布号 |
US7232648(B2) |
申请公布日期 |
2007.06.19 |
申请号 |
US20050219869 |
申请日期 |
2005.09.07 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
TAKAHASHI HIDEYUKI;ISHIZEKI KENJI |
分类号 |
G03C1/73;C08F8/00;G03F7/004;G03F7/027;G03F7/028;G03F7/031;G03F7/032;G03F7/033;G03F7/075 |
主分类号 |
G03C1/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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