发明名称 MAGNETORESISTANCE EFFECT ELEMENT, MANUFACTURING METHOD THEREOF AND THIN FILM MAGNETIC HEAD
摘要 PROBLEM TO BE SOLVED: To attain a high MR ratio by a Heusler alloy layer to easily take a particular crystal structure when a layer adjacent to a spacer layer is the Heusler alloy layer. SOLUTION: The MR element 4 has a configuration comprising a pinned layer 43, the spacer layer 44, and a free layer 45 stacked in this order. A layer of the pinned layer 43 adjacent to the spacer layer 44 is formed of the Heusler alloy layer. A chemical compound 49 is provided to a boundary between the Heusler alloy layer and the spacer layer 44 dottedly in a sea island shape. The chemical compound 49 contains at least one kind of elements included in the Heusler alloy layer. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007150183(A) 申请公布日期 2007.06.14
申请号 JP20050345777 申请日期 2005.11.30
申请人 TDK CORP 发明人 TSUCHIYA YOSHIHIRO;MIZUNO TOMOHITO;SHIMAZAWA KOJI;MIYAUCHI DAISUKE
分类号 H01L43/10;G11B5/39;H01F10/16;H01L43/08 主分类号 H01L43/10
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