| 摘要 |
PROBLEM TO BE SOLVED: To efficiently execute hydrophilic processing for a substrate by utilizing irradiation energy of an ultraviolet ray from a discharge lamp to its maximum. SOLUTION: While the substrate 1 is substantially horizontally transferred by a transfer means 2, the discharge lamp 3 provided in a processing chamber 4 irradiates a processed surface 1A of the substrate 1 with an ultraviolet ray of 172 nm from a distance of not more than 3 mm, and a wet inert gas containing steam of 55-80% is supplied to a gas reservoir 7 from a supply piping 5 in the processing chamber 4. A downflow in a laminar flow state is formed in the processing chamber 4, organic substances adhering on the processed surface 1A are decomposed and become low molecules, and the steam in an atmosphere is decomposed and the decomposed substances react with oxidizing radicals and reducible radicals and radiated in air. Thus, hydrophilic processing of the processed surface 1A of the substrate 1 is performed. COPYRIGHT: (C)2007,JPO&INPIT
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