SUBSTRATE HOLDING DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD

摘要

A substrate holding device includes: a base; a support unit (81) formed on the base to support the rear surface of a substrate (P); a first wall (31) formed on the base, having a first upper surface opposing to the rear surface of the substrate (P) supported by the support unit (81), and surrounding a first space (41) between the substrate (P) supported by the support unit (81) and the base; a second wall (32) formed on the base, having a second upper surface opposing, via a gap, to the rear surface of the substrate (P) supported by the support unit (81), and surrounding the first wall (31); a third wall (33) formed on the base, having a third upper surface opposing to the rear surface of the substrate (P) supported by the support unit (81), and surrounding the support unit (81) and the second wall (32); a flow opening (60) capable of supplying gas to a second space (42) between the first wall (31) and the second wall (32); and a first intake opening (61) for sucking fluid of a third space (43) between the second wall (32) and the third wall (33).