| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a photoresist film having good thickness uniformity by spray coating even when a shoulder has been formed on a surface of a substrate to be coated. <P>SOLUTION: A photoresist film 2 is formed by spray coating on a substrate with a shoulder 1 having a level difference H of 10-1,000 μm disposed on a surface to be coated using a photoresist composition containing a modified siloxane-based surfactant, whereby a laminate is obtained in which the top face 1a and the side face 1b of the shoulder 1 are continuously covered with the photoresist film 2, a thickness of the photoresist film 2 on the top face 1a of the shoulder is 1-40 μm, and a thickness of the photoresist film 2 on a boundary portion between the top face 1a and the side face 1b of the shoulder is ≥75% of a thickness on the top face 1a adjacent to the boundary portion. <P>COPYRIGHT: (C)2007,JPO&INPIT |
