| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition system, when a thin film is deposited by a vapor deposition process, a uniform and dense thin film can be deposited, and, for example, the effective utilization of a film deposition material is possible. SOLUTION: The vapor deposition system 10 comprises: a chamber 11; a crucible 14 provided at the inside of the chamber 11 and storing a film material 13; a substrate holder 12 of holding a substrate 2; a first shutter member 21 and a second shutter member 22 both covering the crucible 14 and provided so as to be displaceable to a check position of checking the going of the vaporized matter of the film material 13 toward the side of the substrate 2 and to an allowable position of allowing the going of the vaporized matter toward the side of the substrate 2; and a control means 32 of controlling the operation of the respective shutter members 21, 22. This control means 32 displaces the first shutter member 21 and the second shutter member 22 to the check position at different times. COPYRIGHT: (C)2007,JPO&INPIT
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