| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laser beam/UV irradiation peripheral exposure apparatus that determines the moving speed of one stage to be an appropriate speed, and to provide a method therefor. <P>SOLUTION: The laser beam/UV irradiation peripheral exposure apparatus comprises a stage 2 holding a substrate; a moving and carrying mechanism 3 for moving the stage in a rotating direction about a vertical line perpendicular to the substrate plane, and in a moving direction and a direction perpendicular to the moving direction; a laser beam unit 5, disposed on the moving path of the moving and carrying mechanism and above the substrate and for irradiating the substrate with a laser beam; a UV irradiation unit 9 that irradiates a peripheral region with a light containing UV rays from an irradiation port; and a control means for controlling the moving and carrying mechanism, in matching with either a first moving speed for making the stage move upon irradiation with a laser beam or a second moving speed for making the stage move upon irradiating with a light that contains UV rays. <P>COPYRIGHT: (C)2007,JPO&INPIT |
