Method for manufacturing a high aspect ratio structure with high fabrication resolution using a localized electrochemical deposition,申请号KR20050073154-传众专利搜索

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发明名称	Method for manufacturing a high aspect ratio structure with high fabrication resolution using a localized electrochemical deposition
摘要
申请公布号	KR100727393(B1)	申请公布日期	2007.06.12
申请号	KR20050073154	申请日期	2005.08.10
申请人		发明人
分类号	H01L21/20;H01L21/288	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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