| 摘要 |
PROBLEM TO BE SOLVED: To enable the entire inner wall of a gas output means, such as a nozzle, to be cleaned by cleaning gas. SOLUTION: A substrate-treating device comprises a reaction tube 37 for performing prescribed treatment to a substrate; a plurality of nozzles 43, 44, 45 for supplying reaction gas into the reaction tube; a piping that is connected to each of the plurality of nozzles, and is connected to the accumulation source of the reaction gas and cleaning gas; a valve provided between each of at least a plurality of nozzles of the piping and the accumulation source of each gas; a mass flow controller that is provided at the piping to control the flow rate of gas; and a controller 103 for controlling the mass flow controller so that the flow rate of the cleaning gas to be supplied to the plurality of nozzles differs, when cleaning the inside of the plurality of nozzles. COPYRIGHT: (C)2007,JPO&INPIT
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